INTESA the INTermediate Electron Source Accelerator facility Seminario di Fisica, INFN Pisa April 19, 2005 Giovanni Maria Piacentino Università di Cassino & INFN Pisa APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Presentation Overview • the Collaboration • Motivations • a short introduction on Microtrons and Microtron Injection; • INTESA: the INTermediate Electron Source Accelerator – – – – – Complex layout; Magnetron Trigger & Modulation Circuit; the RF Cavity: Design, Simulation and the prototype; the INTESA beam injection; other aspects; • Construction Status and Tests • Conclusions APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA the Collaboration • Università di Cassino – G.M. Piacentino, C.E. Pagliarone, B. Preite, J.F. Wyss – B., M. Boscia, van Basten, Alessandro • INFN di Pisa – A. Menzione, APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Motivations • INFN Test Beam Source; • Radiation hardness studies on analogical and digital electronics; • X Ray Source; • Neutron Source; • Industrial Radiography Source; • Production of Radioisotopes; • Radiochemical and Radioactivation Analysis Lab; APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Microtron: Basic Principles • in 1944 Veksler proposed a modification of cyclotron for electrons based on phase stability – Veksler V.I., Dokl. Akad. Nawk USSR 43 (1944) 329 U0 V Vin e 2 f rf U 0 B 2 Vin c e • the electron trajectory in a Microtron is a system of circles increasing in diameter with a common tangent point where the accelerating cavity is placed. Tn 2 En ecB 2E T ecB APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Microtron Injection Toroidal Cavity Injection Cathode inside the Cavity Kapitza I Electronic gun Injection Kapitza II APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA INTESA a General Overview In the original design we wanted to get: Maximum Tunable Energy ~3 ÷ 20 MeV; Range for the Current few nA up to 50-100 μA; Possibility of Beam Extraction in Air; High Beam Monocromaticity; Small Emittance; Small Accelerator size in order to reduce: shilding and facility construction costs; Maintance costs; APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Project Layout MAGNETRON TRIGGER AND MODULATION MAGNETRON MICROWAVE LINE CIRCUIT MICROTRON CONTROL DESK VACUUM PUMP MAGNET AND EXTRACTION SYSTEM HIGH VOLTAGE POWER SUPPLY APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA INTESA the Microtron for INFN Pisa The main feature of INTESA are: • the Injection System: a Kapitza 2 based Injection procedure to maximize the injection and the Total beam Energy; • the Extraction System: – Tunable in Energy; – with a fixed extraction position; • Magnetron Power Supply: a Solid State one. APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Machine Parameters • Fields RF 3 GHz V Ei E0 0.85 MeV B 2 FR c2 E0 Ei e 1.780 KG • Injection Energy Ei 350 KeV • Maximum Energy E Max 18.7 MeV E max =2 2 0.7 m Bc • Maximum orbit diameter D • Maximum number of orbits orbits N MAX 21 orbit MAX APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Magnetron Trigger & Modulation Circuit • RF Cavity will excited with an EM pulse RF=3 GHz, P=2.0 MW provided by a Magnetron (EEV, model M5015) OPERATIONAL CONDITION FREQUENCY RANGE 2994 up to 3002 MHz (tunable) MAGENTIC FIELD 155025 Gauss CATH. EXITATION TENSION 8.5 V CATH EXITATION CURRENT 9.0 A ANODIC CURRENT 90 A (peak) ANODIC VOLTAGE 43 up to 45 KV (peak) PULSE WIDTH 2.0 sec POWER 2.0 MW APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Magnetron Trigger & Modulation Circuit (cont’d) 6 LC Cells T= 5 ms V= 8.5÷9.0 KV for 2 s APPLIED PHYSICS LAB UNIVERSITY OF CASSINO EEV, mod. M5015 INFN PISA Solid State Switch • Power SRC Mod. S03KX020KA assembled by Westcode on our specific design; Mod. S03KX020KA (Westcode) MAXIMUM RATINGS VDRM (repetitive peak off-state voltage) 26KV VDSM (non-repetitive peak off-state voltage) 30KV ITRM (repetitive peak current) 5KA Rise Time (VD=26KV, IT=4KA) 750nsec Turn-ON Time 1.0sec APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA RF Cavity • The RF Cavity resonance frequency have been setted to be RF= 3.0 GHz; • The RF Cavity sizes are: R=38.3 mm, h=15 mm; • The Cavity Q factor is: Q 1 r r 1 h 8800 • δ=1.22*10-4 mm is the penetration depth in the copper for at a frequency of 3 GHz. h • Shunt Resistence: Rs 188Q 648k r 1V2 • For a 580 KeV impulse we get: P 246kW 2 Rs APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA RF Cavity design APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA RF Cavity simulation performed with FEMALBMATHLAB APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA RF Cavity simulation (cont’d) performed with FEMALB MATHLAB APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Prototyping the RF Cavity APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Prototyping the RF Cavity • Oxygen free high density Copper manufactured in Cassino. APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Wave Guide - RF Cavity Coupling • Possibility of changing the beam current remaning into the VSWR Magnetron limits; APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA beam injection: Kapitza II • • • • Choosen a Kapitza II Injection system for INTESA; the cathode is inside the RF cavity; beam tuning up to ~20%; E= 580 keV; APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Microtron Magnet & vacum Chamber in San Piero a Grado (PI) APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Construction Status & Tests Many Parts to be realized • • • • • • • Microwave System; Coupling of Resonator with a Waveguide; Automatic Frequency Control System; Microwave Power Supply; Extraction of Electron Beam; Vacuum System; Magnetic Field and Cooling System; in particular… APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA ATTIVITA’ Pulizia e taratura microwave line Cavità risonante Sistema di estrazione DETTAGLIO Pulizia parti metalliche X Verifica e sostituzione guarnizioni X 1 mese Taratura in Bassa Potenza X Progetto Vacuum system Assemblaggio e collaudo COSTI X Realizzazione 0.3 mesi X Progetto X Realizzazione X Progetto magnete Magnetron DONE-INPG TODOTEMPI 20 K€ X Realizzazione magnete X 9 K€ Acquisto alimentatore X 9 K€ Acquisto pompe per il vuoto X 40 K€ Collocazione della parti nel sito X Collegamento sistema elettrico X Collegamento sistema sicurezza X Collegamento impianti vuoto e per il raffreddamento X Collocazione beam dump X Collaudo sistema e taratura magnetron X APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA ATTIVITA’ Finitura magnete DETTAGLIO DONE-INPG-TODOTEMPI Pulitura con abrasivo X Finitura a tornio X Lucidatura X Verniciatura X Verifica continuità resistenza elettr X Misura del Campo Magnetico Progetto impulsatore Progetto trasformatore d’impulso X Progetto circuito trigger X Progetto delay – line X Progetto HV power supply X Costruzione trasformatore d’impulso X Costruzione sistema di trigger Costruzione delay – line Collaudo delay – line in BT Realizzazione e collaudo impulsatore Collaudo sistema di trigger COSTI X 1 mese X 1 mese X X X 0.3 mesi Collaudo HV power supply X 0.3 mesi Collaudo sistema impulsatore su carico equivalente X 0.3 mesi APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA Conclusions • the Project is pretty much at an advanced state; • All the electronic components are ready and tested; • RF cavity … • xyz needed in order to achieve the goal of building the facility for the end of xx year APPLIED PHYSICS LAB UNIVERSITY OF CASSINO INFN PISA