New Materials For Optoelectronics webnemo.uniroma2.it Development, fabrication and characterization of MATERIALS and SYSTEMS for applications in 1. Optics 2. Integrated optics 3. Optoelectronics 4. Energy 5. Sensors Main activities • 3D self assembly and photonic crystals • Nanoimprinting and Soft Lithography • 3D printing for medical applications • Optical sensors 3D self assembly and photonic crystals Self-assembly Polystiren Photonic crystal 4 3D self assembly and photonic crystals Reflectance spectra of self-assembled PC 3D self assembly and photonic crystals Luminescence of Dye doped PSRB photonic crystal at 32° for increasing excitation power Normalized peak intensity and width as a function of excitation power 3D self assembly and photonic crystals Micro- and nano-ribbon (both doped and undoped) 7 Nanoimprinting and Soft Lithography PDMS mold fabrication master mold mold replica Nanoimprinting and Soft Lithography Laser Interference Lithography In Lloyd Mirror configuration Photo Sol-Gel Ar Laser (UV) Mirror Lloyd mirror m 2 sin Nanoimprinting and Soft Lithography Laser Interference Lithography In Lloyd Mirror configuration Nanoimprinting and Soft Lithography Applications: Optimization of light harvesting for solar cells Nanoimprinting and Soft Lithography Applications: Bioinspired anti-reflection coatings Campione C 0.20 20° C 40° C 60° C 20° BK7 40° BK7 60° BK7 Riflettanza 0.15 0.10 0.05 0.00 300 600 900 1200 Lunghezza d'onda (nm) 1500 1800 3D printing for medical applications 3D printing for medical applications Two-photon scaffold photopolymerization 3D printing for medical applications Optical sensors Optical chemical vapor sensors based on semiconductor Quantum Dots (InP) PL intensity (a.u.) 1.2 0.8 0.4 0.0 700 750 800 850 Wavelength (nm) 900 Optical sensors PL intensity (arb. un.) 28900 ppm 0.8 24800 ppm 20500 ppm 0.6 16400 ppm 0.4 12200 ppm 7900 ppm 0.2 5900 ppm 4600 ppm 0.0 0 2000 4000 6000 8000 10000 time (s) 12000 14000 16000 18000 Fabrication and Characterization facilities - Absorption, transmission, reflection, luminescence (down to 15 K) Absolute luminescence Quantum efficiency Ellipsometry Optcal waveguide characterization Elettroluminesce Photolithografy, laser interference lithography and soft-lithography Spin and dip coating Optical chemical sensing Nanoindenter Clean room Staff: Prof. Mauro Casalboni Prof. Roberto Francini Dr. Paolo Prosposito Dr. Fabio De Matteis Dr. Roberta De Angelis and students webnemo.uniroma2.it 24